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WAFER ROBOT
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Wafer Transfer Robot (for Vacuum Environment)
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UT-VSW3000NS
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UT-VSW3000NS Series 1 |
Mode |
UT-VSW3001NS |
UT-VSW3002NS |
Robot Type |
5 axis SCARA |
Wafer Gripping Method |
Friction gripping method |
Operation Range2 |
W2-axis Upper wrist axis |
20-340 |
W1-axis Lower wrist axis |
20-340 |
B-axis Elbow axis |
20-340 |
A-axis Shoulder axis |
Endless |
Z-axis Elevation axis |
50 mm |
135 mm |
Max. Operation Speed |
W2-axis |
150 /sec |
W1-axis |
150 /sec |
B-axis |
Composite interpolation 950 mm/sec |
A-axis |
Z-axis |
32 mm/sec |
Repeatability |
XYZ direction: P-P 0.05 mm each3 |
Payload |
1.0 kg4 |
Cleanliness |
ISO Class 1 |
Mass |
Approx. 260 kg |
Approx. 285 kg |
Environment |
Temperature |
5-40 ɣ Robot body / 5-80 ɣArm |
Humidity |
20-70 %, No condensation |
Pressure |
Atomospheric pressure 10-6 Pa |
Controller |
CFD19A2 |
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1. Transfer perfomance differs from the standard when options are added.
2. Some arm positions are restrictive.
3. By in our evaluation condition.
4. Including Hand and Wafer. |
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×
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UT-VDW3000HS
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UT-VDW3000HS series 1 |
Mode |
UT-VDW3000HS series |
Robot Type |
4 axis Cylindrical Coordinate |
Wafer Gripping Method |
Friction gripping method |
Operation Range |
X2-axis |
660 mm |
X1-axis |
660 mm |
-axis |
346 |
Z-axis |
100 mm |
Max. Operation Speed |
X2-axis |
380 /sec |
X1-axis |
380 /sec |
-axis |
300 /sec |
Z-axis |
185 mm/sec |
Operating Time |
X2-axis |
0.6 sec |
X1-axis |
0.6 sec |
-axis |
1.5 sec |
Z-axis |
0.7 sec |
Repeatability |
XYZ direction: 0.1 mm each 32 |
Payload |
2 kg 3 |
Cleanliness |
ISO Class 1 |
Mass |
160 kg |
Environment |
Temperature |
5-40 /5-80 |
Humidity |
20-70 %, No condensation |
Pressure |
Atomospheric pressure 10-6 Pa |
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1. Transfer perfomance differs from the standard when options are added.
2. By in our evaluation condition.
3. Including Hand-base, Hand and Wafer. |
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×
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UT-VDX3000NS
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UT-VDX3000NS 1 |
Mode |
UT-VDX3000NS |
Category |
Standard Type |
Robot Type |
2 axis Cylindrical Coordinate |
Operation Range |
X-axis |
850 mm |
-axis |
Endless |
Z-axis |
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Cycle Time |
X-axis |
2.0 sec / 850 mm |
-axis |
2.5 sec / 180 |
Z-axis |
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Repeatability |
XY direction |
0.02 mm32 |
direction |
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Payload |
1.0 kg3 |
Cleanliness |
ISO Class 1 |
Mass |
29 kg |
Environment |
Temperature |
5-40 /5-80 |
Humidity |
20-70 %, No condensation |
Pressure |
Atomospheric pressure 10-7 Pa |
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1. Transfer performance differs from the standard when options are added.
2. by in our evaluation condition.
3. including Hand-base, Hand and Wafer. |
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×
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UT-VFX3000NM
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UT-VFX3000NM Series 1 |
Mode |
UT-VFX3000NM |
UT-VFX3010NM |
Robot Type |
23 axis Cylindrical Coordinate |
Operation Range |
X-axis |
510 mm |
720 mm |
-axis |
340 |
Z-axis |
20 mm |
Max. Operation Speed |
X-axis |
250 /sec. |
-axis |
220 /sec. |
Z-axis |
121 mm/sec. |
Cycle Time |
X-axis |
1.4 sec. |
-axis |
2.4 sec. |
Z-axis |
0.6 sec. |
Repeatability |
XYZ direction: 0.1 mm each |
Payload |
0.7 kgIncluding Hand, Wafer |
Cleanliness |
ISO Class 1ISO-14644 |
Mass |
29 kg35 kg |
Environment |
Temperature |
10-40 ɣAtmosphere side/0-80 ɣVacuum Seal Unit |
Humidity |
20-70 , No condensation |
Pressure |
Atmospheric pressure-10-6 Pa |
Controller |
MFD19D4 |
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1. Transfer performance differs from the standard when options are added.
2. Numbers in parentheses are for Z axis mounting type. |
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×
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UTVW-R2800H
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UTVW-R2800H 1 |
Mode |
UTVW-R2800H |
Robot Type |
4 axis Cylindrical Coordinate |
Operation Range |
X-axis |
670 mm |
-axis |
330 |
Z-axis |
50 mm |
Max. Operation Speed |
X-axis |
120 /sec. |
-axis |
100 /sec. |
Z-axis |
25 mm/sec. |
Cycle Time |
X-axis |
1.5 sec / 680 mm |
-axis |
2.4 sec / 180 |
Z-axis |
1.6 sec / 50mm |
Repeatability |
XYZ direction: 0.1 mm each |
Payload |
2.0 kgincluding Hand-Base, Hand, Wafer |
Cleanliness |
ISO Class 3ISO-14644 |
Mass |
85 kg |
Environment |
Temperature |
15-40 ɣAtmosphere side/15-80 ɣVacuum Seal Unit |
Humidity |
20-70 , No condensation |
Pressure |
Atmospheric pressure-10-6 Pa |
Controller |
SPC3000 |
Power |
Single phase 200-23010 VAC, 50/60 Hz, 5 A |
External Dimensions |
W: 340 x D: 460 x H: 140 mm |
Interface |
LAN 1port for host Controller Parallel I/O for sensor input |
Safety Performance |
PLccategory 1 |
Environment |
Temperature |
10-40 |
Humidity |
30-80 , No condensation |
Teach Pendant External Dimensions |
W: 110 x D: 219 x H: 67 mm |
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1.Transfer performance differs from the standard when options are added. |
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×
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Wafer Transfer Robot (for Atmospheric Environment)
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UT-AXW3000NS
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UT-AXW3000NS Series 1 |
Model |
UT-AXW3000NS |
UT-AXW3001NS |
Robot Type |
6 axis Vertical Articulated Type |
Wafer Gripping Method |
Vacuum checkEdge clamp |
Operation Range 2 |
X-axis |
550 mm |
Y-axis |
2200 mm |
2700 mm |
Z-axis |
1186 mm |
1436 mm |
Max. Operation Speed |
X-axis |
1500 mm/sec |
Y-axis |
1500 mm/sec |
Z-axis |
1500 mm/sec |
Repeatability |
XYZ direction: 0.05 mm each 3 |
Payload |
1.0 kg 4 |
Cleanliness |
ISO Class 1 |
Mass |
Approx. 150 kg |
Approx. 155 kg |
Environment |
Temperature |
5-40 |
Humidity |
20-70 %, No condensation |
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1. Transfer perfomance differs from the standard when options are added.
2. Some arm positions are restrictive.
3. By in our evaluation condition.
4. Including Hand-base, Hand and Wafer. |
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×
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UTM-R3700F
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UTM-R3700F 12 |
Mode |
UTM-R3700F |
Robot Type |
6-axis articulated system |
Operation Range |
X1, X2-axisExtension |
590 mm |
-axisRotation |
332 |
Z-axisElevation |
310-703.8 mm |
Y-axisSlide |
767.5 mm |
A-axisCorrection of Y-axis tilt |
2 |
Max. Operation Speed |
X1, X2-axis |
1600 mm/sec. |
-axis |
540 /sec. |
Z-axis |
1500 mm/sec. |
Y-axis |
1500 mm/sec. |
Cycle Time |
X1, X2-axis |
0.9 sec. / 590 mm |
-axis |
1.0 sec. / 332 |
Z-axis |
0.8 sec. / 703.8 mm |
Y-axis |
1.4 sec. / 1535 mm |
Repeatability |
XY directionscomposite: 0.1 mm, Z direction: 0.1 mm |
Payload |
0.5 kg/armincluding Hand, Wafer |
Cleanliness |
Edge Clamp E/E type |
ISO Class 3ISO-14644 |
Vacuum E/E type |
ISO Class 1ISO-14644 |
Facilities |
Edge Clamp E/E type |
Air |
0.3-0.7 MpaG |
Vacuum E/E type |
Vacuum |
-80 kPaG or less, 10 NL/min. |
Vacuumfor purging) |
-80 kPaG or less, 40 NL/min total |
Environment |
Temperature |
0-40 |
Humidity |
20-70 %, No condensation |
Controller |
CFD19A2 |
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1. Transfer performance differs from the standard when options are added.
2. Wafer sensor and Mapping sensor are available. |
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×
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SPR-AD008BTN/BWN
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SPR-AD008BTN/BWN |
Mode |
SPR-AD008BTN |
SPR-AD008BWN |
-120/035 |
-154/035 |
-120/070 |
-154/070 |
Robot Type |
4 axis Cylindrical Coordinate |
5 axis Cylindrical Coordinate |
Operation Range |
X1, X2-axis |
1200 mm |
1545 mm |
1200 mm |
1545 mm |
-axis |
330 |
Z-axis |
350 mm |
700 mm |
Max. Operation Speed |
X1, X2-axis |
1257 mm/sec |
1618 mm/sec |
1257 mm/sec |
1618 mm/sec |
-axis |
229 /sec |
Z-axis |
286 mm/sec |
572 mm/sec |
Cycle Time |
X1, X2-axis |
2.2 sec / 1200 mm |
2.2 sec / 1545 mm |
2.2 sec / 1200 mm |
2.2 sec / 1545 mm |
-axis |
3.1 sec / 330 |
Z-axis |
2.2 sec / 350 mm |
2.2 sec / 700 mm |
Repeatability |
XYZ0.2 mm each |
Payload |
8 kg/armincluding E/E |
Cleanliness |
ISO Class 4ISO-14644 |
Mass |
240 kg |
260 kg |
Facilities |
Vacuum |
-80 kPa, 10 NL/min |
Environment |
Temperature |
5-40 |
Humidity |
20-70 %, No condensation |
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×
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UT-AFX/W4000NM
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UT-AFX/W4000NM Series 1 |
Mode |
UT-AFW4010NM |
UT-AFW4000NM |
Category |
Long Arm Type |
High Payload Type |
Robot Type |
4axis Cylindrical Coordinate |
Operation Range |
أ-axis |
770 mm |
500 mm |
-axis |
340 |
Z-axis |
300 mm or 450 mm |
-axis |
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182ƣ |
Max. Operation Speed |
أ-axis |
130 /sec |
-axis |
200 /sec |
Z-axis |
250 mm/sec |
-axis |
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180 /sec |
Cycle Time |
أ-axis |
1.4 sec / 770 mm |
1.4 sec / 500 mm |
-axis |
2.2sec/340 |
Z-axis |
1.7 sec / 300 mm or 2.3 sec / 450 mm |
-axis |
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1.7 sec / 180ƣ |
Repeatability |
XYZ0.1 mm |
XYZ0.1 mmR0.1 |
Payload |
1 kg / 2 Nm2 |
4 kg / 8 Nm2 |
Cleanliness |
Edge Clamp E/E type |
ISO Class 3ISO-14644 |
Vacuum E/E type |
ISO Class 1ISO-14644 |
Facilities |
Air |
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0.4-0.7 MPa200 L/min |
Vacuum |
-80 kPa10 NL/min |
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Environment |
Temperature |
5-40 |
Humidity |
20-70 %, No condensation |
Controller |
MFD19D4 |
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1. Transfer performance differs from the standard when options are added.
2. Including Hand-Bace, Hand and Wafer. |
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×
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UT-AFX/W3000NM
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UT-AFX/W3000NM Series 1 |
Mode |
UT-AFX3000NM |
UT-AFW3000NM |
Robot Type |
3 axis Cylindrical Coordinate |
4 axis Cylindrical Coordinate |
Operation Range |
X1, X2-axis |
500 mm |
-axis |
340 |
Z-axis |
300 mm or 450 mm |
Max. Operation Speed |
X1, X2-axis |
1000 mm/sec. |
-axis |
200 /sec. |
Z-axis |
250 mm/sec. |
Cycle Time |
X1, X2-axis |
1.0 sec. / 500 mm |
-axis |
2.2 sec. / 340 |
Z-axis |
1.5 sec. / 300 mm, 2.1 sec. / 450 mm |
Repeatability |
XYZ direction: 0.1 mm each |
Payload |
1.0 kg/armincluding Hand-Base, Hand, Wafer |
Cleanliness |
ISO Class 1ISO-14644 |
Mass |
30 kg |
32 kg |
Facilities |
Vacuum |
-80 kPaG or less, 10 NL/min. |
Vacuum (for Purging) |
-80 kPaG or less, 10 NL/min. |
Environment |
Temperature |
5-40 |
Humidity |
20-70 %, No condensation |
Controller |
MFD19D4 |
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1. Transfer performance differs from the standard when options are added. |
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×
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UTW-REH5500
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UTW-REH5500 12 |
Mode |
UTW-REH5500 |
Robot Type |
4-axis Cylindrical Coordinate |
Operation Range |
X, A-axis |
500 mm |
-axis |
340 |
Z-axis |
300 mm |
Max. Operation Speed |
X, A-axis |
1800 mm/sec. |
-axis |
360 /sec. |
Z-axis |
500 mm/sec. |
Cycle Time |
X, A-axis |
0.5 sec./ 500 mm |
-axis |
1.2 sec./ 340 |
Z-axis |
0.8 sec./ 300 mm |
Repeatability |
XYZ direction: 0.1 mm each |
Payload |
0.5 kg/armincluding Hand, Wafer |
Cleanliness |
ISO Class 3ISO-14644 |
Mass |
32 kg |
Facilities |
Vacuum |
-80 kPaG or less, 10 NL/min. |
Environment |
Temperature |
0-40 |
Humidity |
20-70 %, No condensation |
Controller |
SFD19A2 |
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1. Transfer performance differs from the standard when options are added.
2. Wafer sensor and Mapping sensor are available. |
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×
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UTX/W-RF5501RW
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UTX/W-RF5501RW 1 |
Mode |
UTX-RF5501RW |
UTW-RF5501RW |
Robot Type |
3 axis Cylindrical Coordinate |
4 axis Cylindrical Coordinate |
Operation Range |
X, A-axis |
500 mm |
-axis |
340 |
Z-axis |
300 mm |
R-axis |
180 |
Max. Operation Speed |
X, A-axis |
800 mm/sec. |
-axis |
130 /sec. |
Z-axis |
200 mm/sec. |
R-axis |
150 /sec. |
Cycle Time |
X, A-axis |
1.6 sec. / 500 mm |
-axis |
3.2 sec. / 340 |
Z-axis |
2.5 sec. / 300 mm |
R-axis |
2.0 sec. / 180 |
Repeatability |
XYZ direction: 0.1 mm each R direction: 0.5 |
Payload |
1.5 kg/armincluding Hand-Base, Hand, Wafer |
Cleanliness |
ISO Class 4ISO-14644 |
Mass |
32 kg |
40 kg |
Facilities |
Air |
For wafer clamp 0.25-0.3 MPaG For internal pressure application and condensation prevention 0.05 MPaG |
Environment |
Temperature |
0-40 |
Humidity |
20-70 %, No condensation |
Controller |
CS-8100 |
Power |
100-11510 VAC, 50/60 Hz, 5 A |
External Dimensions |
W: 214 x D: 315 x H: 395 mm |
Interface |
RS-232C 1port for host Controller Parallel I / O by sequencer |
Safety Performance |
PLccategory 1 |
Environment |
Temperature |
0-40 |
Humidity |
20-70 , No condensation |
Teach Pendant External Dimensions |
W: 123 x D: 201 x H: 64 mm |
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1. Transfer performance differs from the standard when options are added. |
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×
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Wafer Aligner
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OFH-4100
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OFH-4100 Series |
Mode |
Applicable Wafer Size 12 |
OFH-4100 |
200-300 mm |
OFH-4101 |
150-200 mm |
OFH-4102 |
100-200 mm |
OFH-4103 |
50-150 mm |
Repeatability |
XY direction: 0.1 mm each direction: 0.2 |
Alignment Time |
1.8 sec. 3 |
Cleanliness |
ISO Class 3 ISO-14644 |
Mass |
8 kg |
Facilities |
Vacuum |
-80 kPaG or less, 10 NL/min. |
Power |
2410 %VDC, 3 A |
Environment |
Temperature |
15-25 |
Humidity |
20-60 %, No condensation |
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1. There are OFH-4100Q series as quartz wafer compatible products. Please inquire details.
2. There are wafer edge inspection series with an option. Please inquire details.
3. For 50 mm wafers, the alignment time is 2.5 seconds. |
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EG-303
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EG-303 Series |
Mode |
EG-303 |
Applicable Wafer Size |
300 mm |
Wafer Holding Method |
Edge clamp |
Repeatability |
High Accuracy Mode |
XY: 0.05 mm : 0.075 |
Normal Mode |
XY: 0.2 mm : 0.1 |
Alignment Time |
High Accuracy Mode |
Average 7.5 sec. |
Normal Mode |
Average 3.5 sec. |
Cleanliness |
ISO Class 3ISO-14644) |
Mass |
7 kg |
Facilities |
Power |
2410 %VDC, 3A |
Environment |
Temperature |
0-40 |
Humidity |
20-70 %, No condensation |
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1. We have a EG-303B with buffered specification and EG-303G with grip state detection sensor. |
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